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References

  1. Chang, C.Y. and S.M. Sze, ULSI technology. New York; Singapore: McGraw-Hill, 1996. pp.587-655.

  2. Elliott, D.J., Integrated circuit fabrication technology. New York: McGraw-Hill, 1982. pp.1-99.

  3. Gise, P. E. and R. Blanchard, Semiconductor and integrated circuit fabrication techniques. Reston, Virginia: Reston Pub. Co., 1979. pp.21-25.

  4. Jenkins, T.E., Semiconductor science: growth and characterization techniques. New York: Prentice Hall, 1995. pp.47-103.

  5. Runyan, W.R. and K.E. Bean, Semiconductor integrated circuit processing technology. Reading, Mass.: Addison-Wesley, 1990. pp.22-52.

  6. Semiconductor processing overview. College Station, Texas: Electronics Training Division, Texas Engineering Extension Service, Texas A&M University System, 1996. pp.14-95

  7. Gsele, U. and Q.Y. Tong, Semiconductor wafer bonding: science and technology. New York : John Wiley, 1999. pp.49-215.

  8. Veronis, A, Integrated circuit fabrication technology. Reston, Virginia: Reston Pub. Co., 1979. pp.13-22.

  9. Peter Van Zant, Microchip fabrication, a practical guide to semiconductor processing. New York: McGraw-Hill, 1996. pp.49-66.

  10. Quirk M. and J. Serda, Semiconductor manufacturing technology. Upper Saddle River, New Jersey: Prentice Hall, 2001. pp.1-90.

  11. Badih El-Kareh. Fundamentals of semiconductor processing technologies. Boston: Kluwer Academic Publishers, 1995. pp.1-38.

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